Hsu C-Y, Wu J-Z. Error-Smoothing Exponentially Weighted Moving Average for Improving Critical Dimension Performance in Photolithography Process. Int J Ind Eng [Internet]. 2017 Jan. 6 [cited 2024 Jun. 30];23(5). Available from: https://journals.sfu.ca/ijietap/index.php/ijie/article/view/3131